It is reported that ZTE will use the CCS system to develop heterogeneous epitaxial growth of gallium nitride ("CB-GaN") technology on silicon chips. Since 2001, ZTE's R&D team has successfully developed a number of unique gallium nitride and aluminum gallium indium phosphide LED technologies. Today, this comprehensive laboratory covering epitaxial growth to equipment processing and packaging has become one of Taiwan's leading R&D centers.
Professor Wu of the Department of Materials Science and Engineering of ZTE University commented: “Ai Siqiang’s Near Coupling Sprinkler® System is the perfect choice for the study of silicon-based GaN. Professor Hong from the Precision Engineering Institute of ZTE University added: “This The reactors are adaptable and easy to operate, and can achieve the reproducibility of a series of parameters we need, which will provide us with the ability to produce high quality silicon-based GaN epitaxial wafers and other new structures. â€
Power and Performance
The PACSystems* RX3i controller provides the foundation for Industrial Internet connectivity. It is a powerful, modular Programmable Automation Controller with a focus on high availability. The RX3i features a single control engine and a universal programming environment to provide application portability across multiple hardware platforms.
With integrated critical control platforms, logic, motion, HMI, process control and high availability based on GE Reflective Memory technology, RX3i increases system performance and flexibility.
Universal Development Environment Gets You Up and Running Faster:
The common software platform across all GE controllers, award-winning Proficy* Machine Edition* software provides the universal engineering development environment for programming, configuration and diagnostics for the entire PACSystems family.
- Programming tools such as tag-based programming, a library of reusable code and a test edit mode for improved online troubleshooting
- User-friendly environment that can increase design flexibility and improve engineering efficiency and productivity
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